Vikram DalalPetersburg, Cole2020-06-302020-06-30Mon Jan 012007-01-01https://dr.lib.iastate.edu/handle/20.500.12876/68096application/pdfenLow pressure chemical vapor deposition of a-Si:H from disilanearticleisulib-bepress-aws-west155566984445rtd/14557https://doi.org/10.31274/rtd-180813-15742Electrical and ElectronicsMaterials Science and EngineeringElectrical and computer engineering;Electrical engineering